Principles of plasma discharges and materials processing

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Principles of plasma discharges and materials processing

種類:

図書

責任表示:

Michael A. Lieberman, Allan J. Lichtenberg

出版情報:

New York : Wiley, c1994

著者名:

ISBN:

9780471005773 [0471005770]

注記:

Includes bibliographical references (p. 559-564) and index
"A Wiley-Interscience publication."

所蔵情報

子書誌情報

タイトルが類似している資料

1. Principles of plasma discharges and materials processing. 2nd ed (electronic bk - : hardcover)
Michael A. Lieberman, Allan J. Lichtenberg. , Wiley-Interscience , 2005

詳細

主題:	Plasma chemistry; Plasma dynamics; Plasma etching; Thin films--Surfaces
分類・件名:	LCC : QC718.5.D9 DDC : 530.4/4 NDC8 : 427.6 LCSH : Plasma dynamics LCSH : Thin films -- Surfaces LCSH : Plasma etching LCSH : Plasma chemistry
LCCN:	94028954
TTLL:	eng
言語:	英語
形態:	xxvi, 572 p. : ill. ; 25 cm
書誌ID:	BA2405445X

内容紹介

目次情報

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5 図書 Waves and interactions in solid state plasmas Platzman, P. M., Wolff, Peter A., 1923- Academic Press	11 電子ブック Fluids and plasmas : geometry and dynamics AMS-IMS-SIAM Joint Summer Research Conference in the Mathematical Sciences on Fluids and Plasmas, Geometry and Dynamics, … American Mathematical Society
6 図書 Regular and stochastic motion Lichtenberg, Allan J., Lieberman, M. A. (Michael A.) Springer-Verlag	12 図書 Diffraction from rough surfaces and dynamic growth fronts Yang, H.-N. (Hong-Ning), 1955-, Wang, G.-C. (Gwo-Ching), 1946-, Lu, T.-M. (Toh-Ming), 1943- World Scientific Pub.